Symmetric non-intrusive and covert technique to render a transistor permanently non-operable

ABSTRACT

A technique for and structures for camouflaging an integrated circuit structure. The technique including forming active areas of a first conductivity type and LDD regions of a second conductivity type resulting in a transistor that is always non-operational when standard voltages are applied to the device.

CROSS REFERENCE TO RELATED APPLICATIONS

This application is a divisional application of U.S. application Ser. No. 10/881,286, filed on Jun. 29, 2004 now U.S. Pat. No. 7,242,063, which has been allowed. This application is also related to U.S. Pat. No. 7,217,977 entitled “Covert Transformation of Transistor Properties as a Circuit Protection Method,” the disclosure of which is incorporated herein by reference.

TECHNICAL FIELD

The present invention relates to integrated circuits (ICs) and semiconductor devices in general and their methods of manufacture wherein the integrated circuits and semiconductor devices employ camouflaging techniques which make it difficult for the reverse engineer to discern how the semiconductor device functions by rendering devices, which appear to be normally functioning devices, non-operable (i.e. OFF).

RELATED ART

The present invention is related to the following US patents and patent applications by some of the same inventors as the present inventors:

-   -   (1) U.S. Pat. Nos. 5,866,933; 5,783,375 and 6,294,816 teach         transistors in a CMOS circuit that are connected by implanted         (and therefore hidden and buried) lines between the transistors         by modifying the p+ and n+ source/drain masks. These implanted         interconnections form 3-input AND or OR circuits that look         substantially identical to the reverse engineer. Also, buried         interconnects force the reverse engineer to examine the IC in         greater depth to try to figure out the connectivity between         transistors and hence their function.     -   (2) U.S. Pat. Nos. 5,783,846; 5,930,663 and 6,064,110 teach a         further modification in the implant masks so that the implanted         connecting lines between transistors have a gap inserted, with         approximately the length of the minimum feature size of the CMOS         technology being used. If this gap is “filled” with one kind of         implant, the line conducts; but if it is “filled” with another         kind of implant, the line does not conduct. The intentional gaps         are called “channel blocks.” The reverse engineer is forced to         determine connectivity on the basis of resolving the implant         type at the minimum feature size of the CMOS process being used.     -   (3) U.S. Pat. No. 6,117,762 teaches a method and apparatus for         protecting semiconductor integrated circuits from reverse         engineering. Semiconductor active areas are formed on a         substrate and a silicide layer is formed both over at least one         active area of the semiconductor active areas and over a         selected substrate area for interconnecting the at least one         active area with another area through the silicide area formed         on the selected substrate area. This connection, as affected by         the silicide layer, is substantially invisible to the reverse         engineer unless imaged via cross-sectional techniques which are         prohibitively costly and time consuming.     -   (4) U.S. Pat. No. 7,217,977 noted above teaches forming         semiconductor active areas on a substrate of a first         conductivity type and placing a lightly doped density active         area of a second conductivity type on one side of the gate. The         size of the lightly doped density active is slightly larger than         the standard lightly doped density active to prevent punch         through.     -   (5) Co-pending U.S. Patent Application No. 60/414,216 filed on         Sep. 27, 2002 discloses modifying a silicide layer mask such         that an artifact edge of the silicide layer a reverse engineer         would see when reverse engineering devices manufactured with         other reverse engineering detection prevention techniques does         not indicate the camouflaging technique being used.

BACKGROUND OF THE INVENTION

The creation of complex integrated circuits and semiconductor devices can be a very expensive undertaking given the large number of hours of sophisticated engineering talent involved in designing such devices. Additionally, integrated circuits can include read only memories and/or EEPROMs into which software, in the form of firmware, is encoded. Additionally, integrated circuits are often used in applications involving the encryption of information. Therefore in order to keep such information confidential (i.e. design, critical information and encryption), it is desirable to keep such devices from being reverse engineered. Thus, there are a variety of reasons for protecting integrated circuits and other semiconductor devices from being reversed engineered.

In order to keep the reverse engineer at bay, different techniques are known in the art to make integrated circuits more difficult to reverse engineer. One technique is to alter the composition or structures of the transistors in the circuit in such a way that the alteration is not easily apparent, forcing the reverse engineer to carefully analyze each transistor (in particular, each CMOS transistor pair for CMOS devices), and thwarting attempts to use automatic circuit and pattern recognition techniques in order to reverse engineer an integrated circuit. Since integrated circuits can have hundreds of thousands or even millions of transistors, forcing the reverse engineer to carefully analyze each transistor in a device can effectively frustrate the reverse engineer's ability to reverse engineer the device successfully.

A conductive layer, such as silicide, is often used during the manufacturing of semiconductor devices. In modem CMOS processing, especially with a feature size below 0.5 μM, a silicide layer is utilized to improve the conductivity of gate, source and drain contacts. In accordance with general design rules, any active region providing a source or drain is silicided. This silicide layer is very thin and difficult for the reverse engineer to see. Hence, if there are ways to modify the transistor through the modification of the silicide layer so as to change the transistor functionality then the modification would be difficult to determine.

FIG. 1 depicts a prior art modem CMOS device. The substrate 20 is a p-type substrate. Referring to the NMOS device, active areas 4, 6 disposed in the substrate 20 have n-type conductivity. The lightly doped density (LDD) active regions 14 have the same conductivity type as active areas 4, 6, but with a much lower dose than active areas 4, 6. The gate comprises a gate oxide layer 8, and a self-aligned polysilicon gate 10. Oxide sidewall spacers 16 form the differentiation between the active areas 4,6 and the LDD regions 14. Field oxide 2 provides separation between transistors. Referring to the PMOS device, a well 21 of n-type conductivity is disposed in the substrate 20. Active areas 23, 25 having p-type conductivity are disposed within n-type well 21. LDD regions 15 have the same conductivity type as active areas 23,25, but with a much lower dose than active areas 23, 25. The gate comprises a gate oxide layer 8 and a selfaligned polysilicon gate structure 10. Oxide sidewall spacers 16 form the differentiation between the active areas 23,25 and the LDD regions 15. The silicide layer 12 is deposited and sintered over the active areas 4, 6, 23, 25 to make better contact. The silicide layer 12 is optionally deposited over the poly gates 10 as well. For the prior art CMOS device of FIG. 1, the NMOS or PMOS transistors normally turn “ON” when a voltage is applied to V₁ 51 or V₂ 50, respectively.

Many other prior art techniques for discouraging or preventing reverse engineering of a circuit cause the IC to look different from a standard IC. What is needed are techniques in which the transistors, and thus the circuits, are constructed to look essentially the same as conventional circuits, but where the functionality of selected transistors is varied. The minor differences between the conventional circuit and the modified circuit should be difficult to detect by reverse engineering processes. In addition, the techniques should strive to modify only a vendor's library design instead of forming a completely new and differently appearing library. Requiring only modification to an existing library results in a simpler path to implementation.

SUMMARY OF THE INVENTION

It is an object of this invention to make reverse engineering even more difficult and, in particular, to use LDD regions of opposite type from the active areas resulting in a transistor that is always off when standard voltages are applied to the device. It is believed that this will make the reverse engineer's efforts all the more difficult in terms of making it very time consuming and perhaps exceedingly impractical, if not impossible, to reverse engineer a chip employing the present invention.

The Inventors named herein have previously filed Patent Applications and have received Patents in this general area of technology, that is, relating to the camouflage of integrated circuit devices in order to make it more difficult to reverse engineer them. The present invention can be used harmoniously with the techniques disclosed above in the prior United States Patents to further confuse the reverse engineer.

Note that the present invention might only be used in one in a thousand instances on the chip in question, but the reverse engineer will have to look very carefully at each transistor or connection knowing full well that for each transistor or connection that he or she sees, there is a very low likelihood that it has been modified by the present invention. The reverse engineer will be faced with having to find the proverbial needle in a haystack.

The present invention comprises a method of manufacturing a semiconductor device in which some selected non-operable transistors look the same as the operable transistors, but which have modified LDD implants. The modified LDD implants are of an opposite conductivity type than the conductivity of the transistor, and hence these implants will result in a transistor that will not turn on when biased.

In another aspect, depending on the design rules of the fabrication process, the present invention will offset the active areas of the transistor so as to increase the dimensions of the oppositely charged LDD regions to keep the transistor OFF.

In another aspect, depending upon the other camouflage techniques being used, the silicide layer may be placed on the device in a manner such that the silicide layer placed on a transistor having sidewall spacers is in the same position as the silicide layer placed on a transistor not having sidewall spacers.

DESCRIPTION OF THE DRAWINGS

FIG. 1 depicts a prior art cross-section of a CMOS device with conventional LDD regions;

FIGS. 2 a through 2 f depict various steps in the manufacturing of a camouflaged integrated circuit structure having oppositely doped LDD regions in accordance with the present invention;

FIG. 3 depicts a cross-section of a CMOS device manufactured in accordance with the present invention wherein the silicide layer is pulled back from the sidewall spacer;

FIGS. 4 a-4 c depict various steps in the manufacturing of another camouflaged integrated circuit structure in accordance with another embodiment of the present invention wherein the LDD regions are slightly larger, and the active regions are slightly smaller than the standard circuit structure; and

FIG. 5 depicts another embodiment of the present invention, wherein the silicide layer is placed over both the active regions and the LDD regions.

DETAILED DESCRIPTION

Semiconductor device manufacturing employs many techniques, process steps, and technologies that are well known. These techniques, process steps and technologies vary with feature size, material composition and other specific device attributes. The following discussions are general discussions regarding modifications that may be made to the masks used in manufacturing a CMOS device. The discussions below are provided as examples only of possible embodiments of the presently disclosed technology.

FIG. 2 a depicts a substrate 20, for purposes of this discussion the substrate 20 is a p-type substrate; however the substrate could alternatively be a n-type substrate. A mask layer 27 is disposed over substrate 20 and photolithographic ally patterned to act as a mask for subsequent implantation. The substrate 20 is then exposed to ions 31. Ions 31 are chosen such that the ions 31 will result is a well of opposite conductivity type to that of substrate 20 (e.g. a n-type well 21 for the case of a p-type substrate 20). The mask layer 27 is removed and another mask (not shown) is disposed over substrate 20 and photolithographic ally patterned to act as a mask for subsequent thermal oxide growth. The substrate 20 is heated and field oxide 2 is grown as shown in FIG. 2 b. The second mask is then removed.

In FIG. 2 b, the field oxide 2 acts to separate the transistors. The left side of the substrate will become the NMOS device, while the right side of the substrate will become the PMOS device. Next, a gate oxide layer 8 and a polysilicon layer 10 are disposed over the substrate 20 using standard semiconductor processing techniques. The polysilicon layer 10 and gate oxide layer 8 are etched on the left side of the substrate to form the poly gate for the NMOS device. The polysilicon layer 10 and gate oxide layer 8 are not etched on the right side, thus providing a mask over the PMOS device. The substrate 20 is then exposed to ions 32. This results in lightly doped density (LDD) active regions 14 a, 14 b, as shown in FIG. 2 c. In this example, the ions 32 are chosen such that the LDD regions 14 a, 14 b are of the same conductivity type as substrate 20 (e.g. p-type in the case of a p-type substrate 20).

In FIG. 2 c, the polysilicon layer 10 and gate oxide layer 8 are etched on the right side of the device to form the poly gate for the PMOS device. A mask 28 is disposed over the substrate 20 and photolithographic ally patterned to cover the NMOS device. The substrate 20 is then exposed to ions 33. This results in LDD regions 15 a, 15 b, as shown in FIG. 2 d. In this example, the ions 33 are chosen such that the LDD regions 15 a, 15 b are of the same conductivity type as well 21 (e.g. n-type for this embodiment).

In FIG. 2 d, a layer of oxide 29 is disposed on the substrate 20 and photolithographically patterned. On the NMOS side of the CMOS device, the oxide layer 29 is etched, through a suitable mask (not shown) to form sidewall spacers 29 a, 29 b. The sidewall spacers 29 a, 29 b are preferably of the same size as sidewall spacers that would be present on a standard NMOS device. The oxide layer 29 disposed over the PMOS device is not etched at this time. The substrate 20 is exposed to ions 34. This exposure results in active areas 4 and 6, as shown in FIG. 2 e. The ions 34 are chosen such that the active areas 4, 6 are of opposite conductivity type to that of the LDD regions 14 a, 14 b (e.g. n-type in this embodiment). Therefore, the active areas 4, 6 have a first conductivity type, and the LDD regions 14 a, 14 b have a second conductivity type. Thus, active areas 4, 6 and LDD regions 14 a, 14 b are oppositely doped.

In FIG. 2 e, the oxide layer 29 is etched to form sidewall spacers 29 c, 29 d adjacent to the poly gate of the PMOS device. The sidewall spacers 29 c, 29 d are preferably of the same size as sidewall spacers that would be present on a standard PMOS device. An oxide layer 30 is disposed over the substrate 20 and photolithographically patterned to cover the NMOS device. The substrate 20 is then exposed to ions 35. This results in the creation of active areas 23 and 25, as shown in FIG. 2 f. The ions 35 are chosen such that the active areas 23, 25 are of opposite conductivity type to that of LDD regions 15 a, 15 b (e.g. p-type in this embodiment). Therefore, the active areas 23,25 have a second conductivity type and LDD regions 15 a, 15 b have a first conductivity type. Thus, active areas 23, 25 and LDD regions 15 a, 15 b are oppositely doped.

In FIG. 2 f, the oxide layer 30 is preferably etched leaving portions 30 a and 30 b, herein referred to as sidewall spacers. The sidewall spacers 30 a, 30 b, 29 c and 29 d are the same dimensions as the sidewall spacers for a standard CMOS device. Thus, the reverse engineer would have no information about the functionality of the device from the sizes of the sidewall spacers 30 a, 30 b, 29 c, 29 d.

As shown in FIG. 2 f, an optional silicide layer 12 may be disposed and patterned over the NMOS and PMOS devices. For the NMOS device, the silicide layer 12 may allow for an electrical conductive path from V₁ 51 to substrate 20 through LDD region 14 a, while the oppositely doped LDD regions 14 a, 14 b prevent an electrical path from active area 4 to active area 6. Thus, the NMOS device formed will be OFF for any standard voltage applied to V₁ 51. One skilled in the art will appreciate that the electrical path between V₁ 51 and the substrate 20 through LDD region 14 a is dependent upon the tolerances of the process. If the silicide layer 12 overlaps a portion of the LDD region 14 a, then the electrical path is formed. If instead, the silicide layer 12 does not overlap a portion of the LDD region 14 a, as shown in FIG. 3, then there is no electrical path from V₁ 51 to substrate 20. However, if there is or is not an electrical path from V₁ 51 to substrate 20, the device formed will be OFF for any standard voltage applied to V₁ 51 due to the presence of LDD regions 14 a, 14 b, which prevent an electrical path from active region 4 to active region 6.

For the PMOS device, the silicide layer 12 may allow an electrical conductive path from V₂ 50 to n-well 21 through LDD region 15 b, while the oppositely doped LDD regions 15 a, 15 b prevent an electrical path from active area 25 to active area 23. Thus, the device formed will be OFF for any standard voltage applied to V₂ 50. One skilled in the art will appreciate that the electrical path between V₂ 50 and n-well 21 through LDD region 15 b is dependent upon the tolerances of the process. If the silicide layer 12 overlaps a portion of the LDD region 15 b, then the electrical path is formed. If instead, the silicide layer 12 does not overlap a portion of the LDD region 15 b, as shown in FIG. 3, then there is no electrical path from V₂ 50 to n-well 21. However, if there is or is not an electrical path from V₂ 50 to n-well 21, the device formed will be OFF for any standard voltage applied to V₂ 50 due to the presence of LDD regions 15 a, 15 b, which prevent an electrical path from active region 25 to active region 23.

One skilled in the art will appreciate that the shorting of the NMOS device to the substrate would not be preferred if the voltage applied to the substrate 20 was not the same as the voltage applied to V₁ 51. Many NMOS devices are connected such that the substrate 20 and V₁ 51 are connected to V_(ss). However, if the voltage applied to substrate 20 was not the same as the voltage applied to V₁ 51, then a silicide block mask may be used to provide a silicide gap 31 that ensures that silicide layer 12 will not extend over LDD region area 14 a, as shown in FIG. 3. Therefore, the silicide layer would be unable to provide an electrical path from V₁ 51 to substrate 20 through LDD region 14 a. However, the presence of the LDD regions 14 a, 14 b being oppositely doped from active areas 4, 6 would prevent the transistor from turning ON when standard voltages are applied to V₁ 51. A silicide block mask may also be used to prevent the silicide from extending over LDD implant 15 b by forming a gap 32 in the silicide layer 12.

FIGS. 4 a-4 c depict another embodiment in accordance with the present invention. FIG. 4 a is similar to FIG. 2 d. The process steps described above in relation to FIGS. 2 a-2 c are utilized to reach a point where a change in the processing will now be described. As in the case of FIG. 2 d, a layer of oxide 29 is disposed on the substrate 20 and photolithographic ally patterned. On the NMOS side of the CMOS device, the oxide layer 29 is etched, through a suitable mask (not shown) to form sidewall spacers 29 a′, 29 b′ shown in FIG. 4 a, which spacers are larger (comparatively wider) than are the sidewall spacers 29 a, 29 b shown in FIG. 2 d. The oxide layer 29 disposed over the PMOS device is not etched. The substrate 20 is exposed to ions 34. The exposure results in active areas 4′ and 6′, as shown in FIG. 4 b. One skilled in the art will appreciate that the active regions 4′ and 6′ in this embodiment are smaller (comparatively less wide) than are the active regions 4,6 of the prior embodiment (see FIG. 2 e). Thus, the remaining LDD regions 14 a′, 14 b′ in FIG. 4 b are larger (comparatively wider) than the LDD regions 14 a, 14 b shown in the prior embodiment (see FIG. 2 e). The oxide sidewall spacers 29 a′, 29 b′ are used to offset the active areas 4′, 6′ away from the gate 10 further than is normal. The ions 34 are chosen such that the active areas 4′, 6′ are of opposite conductivity type to that of the LDD regions 14 a′, 14 b′ (e.g. n-type in this embodiment). Therefore, the active areas 4′, 6′ have an opposite conductivity type than the LDD regions 14 a′, 14 b′.

In FIG. 4 b, the field oxide layer 29 is etched to form sidewall spacers 29 c′, 29 d′ which are larger (comparatively wider) than are the sidewall spacers 29 c, 29 d shown in the prior embodiment (see FIG. 2 t). An oxide layer 30 is disposed over the NMOS device. The substrate 20 is exposed to ions 35. This results in active areas 23′ and 25′, as shown in FIG. 4 c. One skilled in the art will appreciate that the active regions 23′ and 25′ are smaller (comparatively less wide) than active regions 23, 25 shown in FIG. 2 f. Thus, the remaining LDD regions 15 a′, 15 b′ of FIG. 4 c are larger than the LDD regions 15 a, 15 b shown in FIG. 2 f. The field oxide sidewall spacers 29 c′, 29 d′ are used to offset the active areas 23′, 25′ away from the gate 10 further than is normal. The ions 35 are chosen such that the active areas 23′, 25′ are of opposite conductivity type to that of LDD regions 15 a′, 15 b′ (e.g. p-type in this embodiment). Therefore, the active areas 23′, 25′ have an opposite conductivity type than the LDD regions 15 a′, 15 b′.

In FIG. 4 c, the oxide layer 30 is preferably etched leaving portions 30 a and 30 b, herein referred to as conventionally sized sidewall spacers. Further, the sidewall spacers 29 c′ and 29 d′ are also preferably etched to form conventionally sized sidewall spacers 29 c and 29 d as shown in FIG. 4 c. The sidewall spacers 30 a, 30 b, 29 c and 29 d are preferably of the same dimensions as conventional sidewall spacers. Thus, the reverse engineer would have no indication about the functionality of the device by the widths of the sidewall spacers 30 a, 30 b, 29 c, 29 d.

In one embodiment as shown in FIG. 4 c, an optional silicide layer 12 is disposed over the NMOS and PMOS devices. The silicide layer 12 is placed such that the silicide layer 12 does not extend over LDD regions 14 a′, 14 b′, 15 a′ 15 b′, Thus, when a voltage V₁ is applied at point 51 or a voltage V₂ (which may be the same as voltage V_(I)) is applied to point 50, the current will pass through the silicide layer 12 and into active areas 4′ and 25′ respectively, but the current will not pass any further due to the oppositely doped LDD regions 14 a′, 14 b′, 15 a′, 15 b′. Thus, the device will be off for any reasonable applied voltage. The purpose of the slightly smaller active regions 4′, 6′, 23′, 25′ shown in FIG. 4 c is to allow larger LDD regions 14 a′, 14 b′, 15 a′, 15 b′. The larger LDD regions 14 a′, 14 b′, 15 a′, 15 b′ may be desirable in some applications to prevent punch through.

FIG. 5 depicts another embodiment of the present invention. The process steps used to achieve the device in FIG. 5 are almost identical to the steps for the embodiment of FIGS. 4 a-4 c as discussed above. However, in FIG. 5, the silicide layer 12 is placed over both the active regions 4′, 6′, 23′, 25′ as well as the LDD regions 14 a′, 14 b′, 15 a′, 15 b′. In this embodiment, the NMOS device is always ON due to the electrical path created from the voltage V₁ 51 to the silicide layer 12, to the LDD region 14 a′, to the substrate 20, and then to the LDD region 14 b′. The PMOS device is also always ON due to the electrical path from V₂ 50 to the silicide layer 12, to the LDD region 15 b′, to the well 21, and then to the LDD region 15 a′

One skilled in the art will appreciate that there are many different types of CMOS manufacturing processes with different feature sizes. The present invention may be applied to any CMOS manufacturing process. For purposes of further clarification, typical dimensions will be supplied for a 0.35 μm process.

For both the PMOS and NMOS device, the dimensions of the oxide sidewall portions 29 a, 29 b, 29 c, 29 d, determine the size of the LDD regions 14 a, 14 b, 15 a and 15 b of FIGS. 2 a-2 f and FIG. 3. The LDD regions 14 a, 14 b, 15 a and 15 b, and thus the field oxide portions 29 a, 29 b, 29 c and 29 d, are preferably chosen to be sufficiently large to avoid punch through for standard voltages applied to V₂ 50, or V₁ 51 and as small as possible in order to avoid detection. In an embodiment utilizing a 0.35 μm process the LDD regions 14 a, 14 b, 15 a, 15 b are approximately 0.1 micrometers wide and a voltage of approximately 3.5 Volts is applied to V₁ 50 or V₂ 51.

In FIGS. 4 a-4 c and FIG. 5, the LDD regions 14 a′, 14 b′, 15 a′, 15 b′ are approximately 50% larger than a standard side wall spacer width, but the actual width of these LDD regions will depend on a number of factors, including the implant depth and doses.

For the CMOS device in FIG. 3, the dimensions of the optional silicide gap are preferably chosen such that the optional silicide gap is ensured to be over at least the LDD region 14 a or 15 b, taking into account the alignment tolerances for the process, thus preventing V₁ 51 from shorting to the substrate 20 or V₂ 50 from shorting to n-well 21. The dimensions of the optional silicide gap 31, 32 is dependent upon the mask alignment error for the process used. Typically, the optional silicide gap is less than 0.1 micrometers.

For the CMOS device in FIG. 4 c, the dimensions of the optional silicide gap are preferably chosen such that the optional silicide gap will occur over at least the LDD regions 14 a′, 14W, 15 a′, 15 b′, taking into account the alignment tolerances for the processes used, thus preventing V₁ 51 from shorting to the substrate 20 or V₂ 50 from shorting to n-well 21.

The present invention provides an IC that is difficult to reverse engineer given that the conductivity type of the LDD region implants is very difficult to determine given the small dosage levels used in forming LDD regions. Additionally, the silicide layer is difficult to detect. As a result, the false transistor formed in accordance with the present invention will look operational to the reverse engineer. In a sea of millions of other transistors, these features will be difficult to detect easily, thus forcing the reverse engineer to examine every transistor closely. Such a task makes reverse engineering semiconductor chips using the present invention much less desirable and much more expensive due to the need to closely examine each and every transistor formed on a device.

Additionally, the invention is preferably not used to completely disable a multiple transistor circuit, but rather to cause the circuit to function in an unexpected or non-intuitive manner. For example, what appears to be an OR gate to the reverse engineer might really function as an AND gate with the non-functioning transistor(s). Or, what appears as an inverting input might really be non-inverting. The possibilities are almost endless and are almost sure to cause the reverse engineer so much grief that he or she gives up as opposed to pressing forward to discover how to reverse engineer the integrated circuit device on which these techniques are utilized.

Having described the invention in connection with certain preferred embodiments thereof, modification will now certainly suggest itself to those skilled in the art. As such, the invention is not to be limited to the disclosed embodiments, except as is specifically required by the appended claims. 

1. A method of camouflaging a circuit, comprising: forming a gate structure in a substrate; forming a first active region in the substrate; providing a first lightly doped density active region adjacent the first active region, said first lightly doped density active region having a first conductivity type and said adjacent first active region having a second conductivity type; forming a second active region in the substrate; forming a second lightly doped density active region adjacent the second active region, said second lightly doped density active region having a first conductivity type and said adjacent second active region having a second conductivity type; forming a conductive layer disposed over at least a portion of said first active regions; and forming a gap in the conductive layer such that the gap prevents an electrical path from the conductive layer to the first lightly doped density active region for a nominal voltage applied to the conductive layer; wherein the circuit is non-operational when the nominal voltage is applied.
 2. The method of claim 1, further comprising: forming a sidewall spacer disposed on the substrate on each side of the gate structure.
 3. The method of claim 2, wherein said first and second lightly doped density regions each have a width greater than the width of a sidewall spacer.
 4. The method of claim 2, wherein the sidewall spacers have the same dimensions as conventional sidewall spacers.
 5. A method for camouflaging a circuit, comprising: providing a substrate; forming source and drain structures in said substrate on either side of a gate structure, the source and drain structures being of a first conductivity type: forming a first lightly doped region in said substrate disposed in contact with said source structure and adjacent said gate structure, said first lightly doped region being of a second conductivity type; forming a second lightly doped region in said substrate disposed in contact with said drain structure, said second lightly doped region being of the second conductivity type; forming a first conductive layer disposed over and in contact with at least a portion of said source region; and forming a second conductive layer disposed over and in contact with at least a portion of said drain region; the first and second conductive layers having a mask selectable width for controlling whether said first and second conductive layers make contact with said first and said second lightly doped regions to thereby selectively control whether the circuit is permanently ON or permanently OFF.
 6. The method of claim 5, wherein the first and second conductive layers are in contact with said first and said second lightly doped regions whereby the circuit structure is always ON.
 7. The method of claim 5, wherein the first and second conductive layers are not in contact with said first and said second lightly doped regions whereby the circuit structure is always OFF.
 8. The method of claim 5, further comprising: camouflaging an integrated circuit having a plurality of operable transistors by connecting at least one camouflaged circuit structure to one or more of the operable transistors to cause the integrated circuit to function in an unexpected or non-intuitive way, wherein said camouflaged circuit structure is non-operational for a nominal voltage applied to said camouflaged circuit structure, the non-operational circuit structure being programmably either permanently ON or permanently OFF.
 9. The method of claim 1, wherein said conductive layer is a silicide layer.
 10. The method of claim 9, further comprising: forming a gap in the silicide layer to prevent the silicide layer from contacting said first lightly doped density active regions such that the gap prevents an electrical path of a nominal voltage from said silicide layer to the first lightly doped density active region.
 11. The method of claim 5, further comprising: forming a sidewall spacer disposed on the substrate on each side of the gate structure.
 12. The method of claim 11, wherein said first and second lightly doped density regions each have a width greater than the width of a sidewall spacer.
 13. The method of claim 12, wherein the sidewall spacers have the same dimensions as conventional sidewall spacers.
 14. A method of camouflaging a circuit, comprising: forming a gate structure in a substrate; forming a first active region in the substrate; providing a first lightly doped density active region adjacent the first active region, said first lightly doped density active region having a first conductivity type and said adjacent first active region having a second conductivity type; forming a second active region in the substrate; forming a second lightly doped density active region adjacent the second active region, said second lightly doped density active region having a first conductivity type and said adjacent second active region having a second conductivity type; and forming a conductive layer disposed over said first active region and said first lightly doped density active region such that said conductive layer provides an electrical path for a nominal voltage from said conductive layer to the first lightly doped density active region; wherein the circuit is non-operational when the nominal voltage is applied to said conductive layer.
 15. The method of claim 14, wherein said conductive layer is a silicide layer. 